Self-hardening of Nanocrystalline Ti-B-N Thin Films

Growth and Characterization of Ti-Si-N Thin Films

Nanocrystalline structure and hardness of thin films

WaSiaN films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline a-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm. For WaSi films there is a good correlation between the increase of the hardness and ...

Nanocrystalline silicon thin films on PEN substrates

We study the structural and electrical properties of intrinsic layers growth close to the transition between amorphous silicon (a-Si:H) and nanocrystalline silicon (nc-Si:H) deposited on glass and PEN without intentional heating. These samples showed different behaviour in Raman shift and XRD spectra when compared with that of samples deposited at 200oC. Electrical properties of these films als...

Ferromagnetism in nanocrystalline epitaxial Co:TiO2 thin films

Multifunctional nanostructured Ti-Si-C thin films

In this Thesis, I have investigated multifunctional nanostructured Ti-Si-C thin films synthesized by magnetron sputtering in the substrate-temperature range from room temperature to 900 °C. The studies cover high-temperature growth of Ti3SiC2 and Ti4SiC3, low-temperature growth of Ti-Si-C nanocomposites, and Ti-Si-C-based multilayers, as well as their electrical, mechanical, and thermal-stabili...